4 ms·
Lithography requires the highest possible average intensity, while the pulse length is irrelevant. The laser-driven tin plasma sources used in EUV lithography p
by fsh 3y ago
Lithography requires the highest possible average intensity, while the pulse length is irrelevant. The laser-driven tin plasma sources used in EUV lithography produce around 7 orders of magnitude more power than the most powerful sources based on high harmonic generation.
- amelius 3y ago> while the pulse length is irrelevant I was thinking along the lines of: 1 attosecond corresponds to .3nm, so very short wavelength, so very deep UV.