4 ms·
Because it has absolutely awful throughput. Electron-beam lithography has an output measured in days per wafer. Meanwhile, EUV can easily output 150+ wafers per
by crote 3y ago
Because it has absolutely awful throughput. Electron-beam lithography has an output measured in days per wafer. Meanwhile, EUV can easily output 150+ wafers per hour.
When the choice was made to go for EUV, E-Beam was actually the most mature technology available for next-gen lithography - but it just wasn't economically viable. The technology has remained in development over the years, but not a lot has changed yet.
If you want to know more about the topic, I can strongly recommend this video from Asianometry: https://www.youtube.com/watch?v=RmgkV83OhHA https://www.youtube.com/watch?v=RmgkV83OhHA
- rowanG077 3y agoI mean if the machine is 100x cheaper to buy/maintain it might still be worth it. The price for EUV in TCO per machine is insane.
- _hypx 3y agoIt would have to be on the order of 1,000-10,000x cheaper for it be worth it. Not to mention that each wafer needs dozens of layers to function. So you will need to wait a very long time for all the layers to be completed.
- patmorgan23 3y agoNot if the throughout is 1000x slower.
- zogomoox 3y agoIf China can't get their hands on EUV, E-Beam seems a logical step for them to develop anyway.