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Yup, back in 2003 I was doing experimental work on creating better EUV mirrors and the amount of reflection achieved was way too low to support any machine with
by Confusion 7y ago
Yup, back in 2003 I was doing experimental work on creating better EUV mirrors and the amount of reflection achieved was way too low to support any machine with a design similar to UV machines. You needed either a (much) higher intensity source or fewer mirrors.
I've been out of that loop for a while, so I don't know how the design of the EUV machines turned out.
- ragebol 7y agoAFAIK, some (less than?) 2% of energy put into the EUV source ends up at the wafer. The EUV-source has been the biggest struggle for ASML from what I gathered in media. Apparently, tiny droplets of tin are created by spinning some disk(s) and then those droplets are zapped with with a laser before they emit EUV. Those machines are crazy complex.
- Dylan16807 7y agoUV is under 1%, and EUV is under .01%