""" The key to 3D deep sub-diffraction OBL is the development of a unique material with two chemical activation channels. One is for photopolymerization and the

""" The key to 3D deep sub-diffraction OBL is the development of a unique material with two chemical activation channels. One is for photopolymerization and the other is for photoinhibition. For this aim, the material should be designed to satisfy the following requirements. First, it should include an initiator that is highly photosensitive to two-photon absorption generated by a writing beam, which allows for the near-threshold fabrication. Accordingly, it is possible to achieve a minimum degree of photopolymerization required for building solidified structures with a feature size smaller than the focal spot of the writing beam. Second, it should exhibit an effective inhibition of the 2PP process, which is """