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We need to see their detailed implementation strategy to understand whether this can ever be viable. If it is, you can be sure that ASML is already working on i
by 11thEarlOfMar 11mo ago
We need to see their detailed implementation strategy to understand whether this can ever be viable. If it is, you can be sure that ASML is already working on it.
- ilove196884 11mo agoWe know it can't be used in a fab because the mask in EUV scanners is in a hydrogen ambient to protect the optics and masks whereas the synchrotron is in a perfect vacuum. Now EUV has tons of problems with stochastics and as the wavelength decreases these errors increase. Second 13.5nm has optics with highest reflectivity which lower or higher wavelengths do not. It was tried by IBM but it failed and many in IBM and AMD's lithography team ended up at ASML.