Nobody has done low-nm lithography on anything but silicon, on integrated circuits. The reason is that such integrated circuits could not compete in cost, so d

Nobody has done low-nm lithography on anything but silicon, on integrated circuits. The reason is that such integrated circuits could not compete in cost, so developing all the fabrication equipment for them would not be worthwhile. On the other hand, on special discrete devices, e.g. microwave transistors, and on experimental devices, "low-nm" (which means tens of nm for the most advanced devices) has been done for a long time. The low fabrication yields, which would be unacceptable for the mass production of integrated circuits, have much less relevance for small and expensive discrete devices and for experimental devices.