Spin in is an interesting tech history. As for cvd low-k, it is mostly how much C is in your silicon, and likewise how you setup the damascene etch stop. Intel

Spin in is an interesting tech history. As for cvd low-k, it is mostly how much C is in your silicon, and likewise how you setup the damascene etch stop. Intel was low-ish k in about 2002 on 130nm. I am not so sure tsm was first. Depends on how you define lowk.