3 ms·
One nm wavelength? So this could be used as a source for photolithography?
by RantyDave 2y ago
One nm wavelength? So this could be used as a source for photolithography?
- phkahler 2y agoCurrent EUV sources from ASML are 13.5nm IIRC. It's increasingly difficult to do any kind of optics (focusing, masks, or even mirrors) at shorter wavelength.
- 6SixTy 2y agoFar as I know, X-Ray lithography is even harder than EUV. Mostly because optical manipulation of X Rays barely exist, and X Rays only interact with heavier elements.
- deleted 2y ago[deleted]