Context - it’s a Lego model of a machine used to produce computer chips: > The TWINSCAN EXE:5000 is the first 0.55 NA, or ‘High NA’, EUV lithography system. It

Context - it’s a Lego model of a machine used to produce computer chips: > The TWINSCAN EXE:5000 is the first 0.55 NA, or ‘High NA’, EUV lithography system. Its 8 nm resolution will enable chipmakers to print with a single exposure features 1.7 times smaller – and therefore achieve transistor densities 2.9 times higher – than those possible using TWINSCAN NXE systems. https://www.asml.com/en/products/euv-lithography-systems/twinscan-exe-5000 https://www.asml.com/en/products/euv-lithography-systems/twi...