Slower because steering a beam around to draw a pattern is much slower than using a light source through a mask to expose the entire pattern at once. I think e

Slower because steering a beam around to draw a pattern is much slower than using a light source through a mask to expose the entire pattern at once. I think electron beams might be used to make some of the masks for regular lithography, but I'm sure there is someone here on HN with actual experience in these areas with actual knowledge ;-)