4 ms·

Black Silicon photodetector hits record-breaking 132% efficiency (2020)

peter_d_sherman 3y ago
>"At 132 percent, that means you get on average 1.32 electrons for every photon. It was made using Black Silicon as the active material, with nanostructures shaped like cones and columns, absorbing UV light." Related: https://en.wikipedia.org/wiki/Black_silicon https://en.wikipedia.org/wiki/Black_silicon >"In 1999, a Harvard University group led by Eric Mazur developed a process in which black silicon was produced by irradiating silicon with femtosecond laser pulses.[34] After irradiation in the presence of a gas containing sulfur hexafluoride and other dopants, the surface of silicon develops a self-organized microscopic structure of micrometer-sized cones. The resulting material has many remarkable properties, such as absorption that extends to the infrared range, below the band gap of silicon, including wavelengths for which ordinary silicon is transparent. sulfur atoms are forced to the silicon surface, creating a structure with a lower band gap and therefore the ability to absorb longer wavelengths." https://en.wikipedia.org/wiki/Reactive-ion_etching https://en.wikipedia.org/wiki/Reactive-ion_etching >"RIE [Reactive Ion Etching] uses chemically reactive plasma to remove material deposited on wafers. The plasma is generated under low pressure (vacuum) by an electromagnetic field. High-energy ions from the plasma attack the wafer surface and react with it." [...] "The types and amount of gas used vary depending upon the etch process; for instance, sulfur hexafluoride is commonly used for etching silicon." [...] "Other types of RIE systems exist, including inductively coupled plasma (ICP) RIE. In this type of system, the plasma is generated with a radio frequency (RF) powered magnetic field." https://en.wikipedia.org/wiki/Inductively_coupled_plasma https://en.wikipedia.org/wiki/Inductively_coupled_plasma >"An inductively coupled plasma (ICP) or transformer coupled plasma (TCP)[1] is a type of plasma source in which the energy is supplied by electric currents which are produced by electromagnetic induction, that is, by time-varying magnetic fields.[2]" https://en.wikipedia.org/wiki/File:Inductively_Coupled_Plasma.jpg https://en.wikipedia.org/wiki/File:Inductively_Coupled_Plasm...

>"At 132 percent, that means you get on average 1.32 electrons for every photon. It was made using Black Silicon as the active material, with nanostructures shaped like cones and columns, absorbing UV light." Related: https://en.wikipedia.org/wiki/Black_silicon https://en.wikipedia.org/wiki/Black_silicon >"In 1999, a Harvard University group led by Eric Mazur developed a process in which black silicon was produced by irradiating silicon with femtosecond laser pulses.[34] After irradiation in the presence of a gas containing sulfur hexafluoride and other dopants, the surface of silicon develops a self-organized microscopic structure of micrometer-sized cones. The resulting material has many remarkable properties, such as absorption that extends to the infrared range, below the band gap of silicon, including wavelengths for which ordinary silicon is transparent. sulfur atoms are forced to the silicon surface, creating a structure with a lower band gap and therefore the ability to absorb longer wavelengths." https://en.wikipedia.org/wiki/Reactive-ion_etching https://en.wikipedia.org/wiki/Reactive-ion_etching >"RIE [Reactive Ion Etching] uses chemically reactive plasma to remove material deposited on wafers. The plasma is generated under low pressure (vacuum) by an electromagnetic field. High-energy ions from the plasma attack the wafer surface and react with it." [...] "The types and amount of gas used vary depending upon the etch process; for instance, sulfur hexafluoride is commonly used for etching silicon." [...] "Other types of RIE systems exist, including inductively coupled plasma (ICP) RIE. In this type of system, the plasma is generated with a radio frequency (RF) powered magnetic field." https://en.wikipedia.org/wiki/Inductively_coupled_plasma https://en.wikipedia.org/wiki/Inductively_coupled_plasma >"An inductively coupled plasma (ICP) or transformer coupled plasma (TCP)[1] is a type of plasma source in which the energy is supplied by electric currents which are produced by electromagnetic induction, that is, by time-varying magnetic fields.[2]" https://en.wikipedia.org/wiki/File:Inductively_Coupled_Plasma.jpg https://en.wikipedia.org/wiki/File:Inductively_Coupled_Plasm...