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That's called electron-beam lithography: > This form of maskless lithography has high resolution but low throughput, limiting its usage to photomask fabricatio
by civilitty 3y ago
That's called electron-beam lithography:
> This form of maskless lithography has high resolution but low throughput, limiting its usage to photomask fabrication, low-volume production of semiconductor devices, and research and development. [1]
The beam has to scan across the entire wafer instead of exposing it all at once, so it's extremely slow and uneconomical for mass production.
[1] https://en.wikipedia.org/wiki/Electron-beam_lithography https://en.wikipedia.org/wiki/Electron-beam_lithography
- XorNot 3y agoIt's worth noting that necessity has tendency to make this possible though: the original CD laser diodes required extreme equipment investment to mass produce. You could conceive of making the speed up in parallel production.
- LargoLasskhyfv 3y agoOr use an 8x8 array of them and have 64bits...err...beams at the same time.
- ben_w 3y agoIIRC you can't usefully do that, because the limit is from the combined electric field of the electrons in the beam(s) causing blurriness — more beams at fixed current per beam means more blur.
- LargoLasskhyfv 3y agoTreat it like a phased array, with hypermegamodulation by realtime machine learning artificial fuzzy logic, canceling out any blurriness in advance, producing the finest and sharpest turbonanoscalpels, able to etch any sketch, fast. Built to last! F... yeah!
- ben_w 3y agoI'm fairly sure they're two different things: e-beam (as per your link) does the reaction with the electrons themselves, whereas FEL uses an electron beam as a lasing medium. https://en.wikipedia.org/wiki/Free-electron_laser https://en.wikipedia.org/wiki/Free-electron_laser