You would think you can make the lithography faster with electron beams by just having many beams in parallel. But as far as I understand that’s doesn’t really

You would think you can make the lithography faster with electron beams by just having many beams in parallel. But as far as I understand that’s doesn’t really work if you try to have too many beams: keep in mind that the electron beams would be extremely negatively charged. So they’ll repell each other if they get too close.