The thing about gates is that leakage is an issue, so Intel went to great lengths to increase the permittivity of (aka K) of their transistor gates[1] using Haf

The thing about gates is that leakage is an issue, so Intel went to great lengths to increase the permittivity of (aka K) of their transistor gates[1] using Hafnium and other Oxides. [1] https://www.intel.com/pressroom/kits/advancedtech/doodle/ref_HiK-MG/high-k.htm https://www.intel.com/pressroom/kits/advancedtech/doodle/ref...