6 ms·

Lenses are used so the feature size on the mask is larger than the feature size on the wafer. https://www.nikon.com/about/technology/product/semiconductor/inde

• novaRom 6y ago
  Yes, but only few times. Still not clear how an initial mask has been produced? From file to mask - a kind of printer or a laser?
  • baybal2 6y ago
    for >1 micron it's optical lithographic transfer, for <1 micron, it's e-beam lithography.