> Here are the real numbers for the reactions in Scheme 1: 0.25 x 0.58 x 0.74 x 0.21 x 0.23 = .005 (0.5%) This reminds me of the problems to scale up EUV lith

> Here are the real numbers for the reactions in Scheme 1: 0.25 x 0.58 x 0.74 x 0.21 x 0.23 = .005 (0.5%) This reminds me of the problems to scale up EUV lithography which are bottlenecked on producing strong enough EUV light. They put in 20 kW of power to get out 200 W at the target wavelength of 13.5 nm, so light generation itself only has 1% efficiency, and then you need to reflect it at mirrors etc. to focus it (lenses don't work at those wavelength) and that makes only 2% of the light actually reach the waver [2]. [1]: https://www.laserfocusworld.com/blogs/article/16569161/the-secret-of-euv-generation https://www.laserfocusworld.com/blogs/article/16569161/the-s... [2]: https://en.wikipedia.org/wiki/Extreme_ultraviolet_lithography#Light_source_power,_throughput,_and_uptime https://en.wikipedia.org/wiki/Extreme_ultraviolet_lithograph...