4 ms·
Yeah, they calculate the transfer function of the pattern and then pattern the mask to achieve the end result printed on the silicon substrate. With EUV lithogr
by spectramax 7y ago
Yeah, they calculate the transfer function of the pattern and then pattern the mask to achieve the end result printed on the silicon substrate. With EUV lithography, it substantially reduced this pattern complexity.
Jim talks about it at this mark in this presentation: https://youtu.be/Qnl7--MvNAM?t=784 https://youtu.be/Qnl7--MvNAM?t=784