> Even if EUV tool does 1 exposure a little bit slower than quadruple patterning, it can do 4 patterning steps in one — a very huge thing in process technology.

> Even if EUV tool does 1 exposure a little bit slower than quadruple patterning, it can do 4 patterning steps in one — a very huge thing in process technology. Would that also remove some patterning constraints? Give the pattern "more freedom".