3 ms·

You're overhyping the knowledge a bit. It can't have been gathered over that great a span of time because he was only in his late teens when he did this. Also I

by furi 7y ago

You're overhyping the knowledge a bit. It can't have been gathered over that great a span of time because he was only in his late teens when he did this. Also I've been able to work out most of it myself over a period of about a year using the book "Introduction to Semiconductor Manufacturing Technology" by Hong Xiao for general process layout (what steps are necessary, in what order, with what chemicals, etc.) and a scattering of papers, chemical datasheets and ResearchGate discussions for the specific parameters to use. If anybody would like to get into this kind of thing I highly recommend that book, it's very approachable for somebody coming from computing without a particular semiconductor/chemistry/material science background.

ChickeNES 7y ago
Do you have a list of the papers you found helpful in addition to the book?
- furi 7y ago
  These were useful for parameters (conceptually anyway, I haven't done any hard labwork with this yet): Kirt R. Williams, Kishan Gupta, Matthew Wasilik - Etch Rates for Micromachining Processing—Part II Mark R. Jackson - Effects of Radio Frequency Power and Sulfur Hexafluoride Flowrate on Etch Rate of Silicon Dioxide S. A. Moshkalyov, C. Reyes-Betanzo, R.C. Teixeira, I. Doi, M.B. Zakia, J.A. Diniz, J. Swart - Etching of Polycrystalline Silicon in SF6 Containing Plasmas I.J. Kima, H.K. Moona, J.H. Leea, N.E. Leea, J.W. Jungc, S.H. Cho - Silicon nitride etch characteristics in SF6/O2 and C3F6O/O2 plasmas and evaluation of their global warming effects http://microchem.com/pdf/PMMA_Data_Sheet.pdf http://microchem.com/pdf/PMMA_Data_Sheet.pdf These for further general process design/example values: http://ww2.che.ufl.edu/unit-ops-lab/experiments/semiconductors/semiconductors-index.htm http://ww2.che.ufl.edu/unit-ops-lab/experiments/semiconducto... These are by no means the be all and end all, they were just useful for the parts of the process I've looked at in detail so far and there are often several options at every step for chemicals and approaches, these were suited to what I was aiming for.

by furi 7y ago

ChickeNES 7y ago

Do you have a list of the papers you found helpful in addition to the book?

furi 7y ago
These were useful for parameters (conceptually anyway, I haven't done any hard labwork with this yet): Kirt R. Williams, Kishan Gupta, Matthew Wasilik - Etch Rates for Micromachining Processing—Part II Mark R. Jackson - Effects of Radio Frequency Power and Sulfur Hexafluoride Flowrate on Etch Rate of Silicon Dioxide S. A. Moshkalyov, C. Reyes-Betanzo, R.C. Teixeira, I. Doi, M.B. Zakia, J.A. Diniz, J. Swart - Etching of Polycrystalline Silicon in SF6 Containing Plasmas I.J. Kima, H.K. Moona, J.H. Leea, N.E. Leea, J.W. Jungc, S.H. Cho - Silicon nitride etch characteristics in SF6/O2 and C3F6O/O2 plasmas and evaluation of their global warming effects http://microchem.com/pdf/PMMA_Data_Sheet.pdf http://microchem.com/pdf/PMMA_Data_Sheet.pdf These for further general process design/example values: http://ww2.che.ufl.edu/unit-ops-lab/experiments/semiconductors/semiconductors-index.htm http://ww2.che.ufl.edu/unit-ops-lab/experiments/semiconducto... These are by no means the be all and end all, they were just useful for the parts of the process I've looked at in detail so far and there are often several options at every step for chemicals and approaches, these were suited to what I was aiming for.