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Nice article with a bit of low-level details. We are indeed encountering the problem that light wavelength is now small enough for us! So using 15nm EUV for mul
by sytelus 7y ago
Nice article with a bit of low-level details. We are indeed encountering the problem that light wavelength is now small enough for us! So using 15nm EUV for multiple patterns to get 5nm. Only two foundries left in the entire world which can do such process (Intel and others are years behind).
- dfrage 7y ago> Intel and others are years behind Not clear anyone other than Intel is trying, but Intel's situation is much more complicated. They tried for a purely optical for its life "10nm" node more aggressive than TSMC's initial "7nm" node and catastrophically failed. There's clearly some top level management issues there, a big problem for Intel for decades, and it's extremely worrying they let them destroy a generation of their crown jewel. But that doesn't tell us much about their "7nm" node very roughly equivalent to Samsung and TSMC's "5nm" nodes, except those companies have a lot more real world EUV experience, but it's not always good to be a pioneer. Intel could conceivably get back in the game in about the same time frame as these two companies exit "5nm" risk production, we just don't know. All we know is that they're buying EUV machines and installing them in multiple fabs.