3 ms·
Yields will suffer with current DUV process which must be multiple, multiple patterning. The mentioned switch to EUV reduces multiple patterning and should impr
by calchris42 8y ago
Yields will suffer with current DUV process which must be multiple, multiple patterning. The mentioned switch to EUV reduces multiple patterning and should improve yield. But EUV has had its own challenges.