Depending on the layout complexity, mask write times for EUV masks can take many days with a single beam mask writing tool. Considering that even with EUV dozen

Depending on the layout complexity, mask write times for EUV masks can take many days with a single beam mask writing tool. Considering that even with EUV dozens of masks are needed for a mask set for a 7nm product, this would result in a few months of total processing time, of course multiple mask writers are typically used in manufacturing sets. The time issue can be mitigated but not at unlimited cost.