3 ms·
Not my field, but I'd guess that one problem is that the hotter the photon, the better it is at penetrating matter. EUV photomasks are already a real pain in th
by sbierwagen 9y ago
Not my field, but I'd guess that one problem is that the hotter the photon, the better it is at penetrating matter. EUV photomasks are already a real pain in the butt to make[1], and making them work for shorter wavelengths probably introduces even more excitingly intractable engineering problems.
1: https://www.nist.gov/sites/default/files/documents/pml/div683/conference/Rice_2011.pdf https://www.nist.gov/sites/default/files/documents/pml/div68...
- justinjlynn 9y agoMasks may be a pain, but the pellicle (the part that protects the masks from contamination) is non-existent unless they've made a breakthrough I'm unaware of: https://www.semiwiki.com/forum/content/3720-euv-pellicles.html https://www.semiwiki.com/forum/content/3720-euv-pellicles.ht... basically this means any dust or contamination of the mask by anything bigger than 50-80 nm will possibly ruin the maskset and destroy the yield until it is replaced. It's a huge challenge.