3 ms·

Yes that's true, but shot noise is a real problem.

• kurthr 10y ago
  Yes, shot noise... secondary electrons, resist issues, mask issues are all real. Similar issues come up for immersion at these scales. It's no panacea (and hasn't even reached tact time parity), but nothing is at this point. What is amazing is that the investment in EUV has been going on for decades and still hasn't reach production. If they could run the EUV sources at 4 times their current power, there would be huge increases in equipment sales and conversely exposure and mask complexity would decrease substantially. Increased exposure dose could deal with some of the shot noise effects (only 3% at 10nm so less than 8% ITRS spec?). We would also probably see equipment free up to allow 14/20/28nm litho costs go down. So it's a win-win.