Some googling indicates that synchrotrons are not as desirable as EUV sources as I had thought. This article from ~2000 lays it out: http://digbib.ubka.uni-kar

Some googling indicates that synchrotrons are not as desirable as EUV sources as I had thought. This article from ~2000 lays it out: http://digbib.ubka.uni-karlsruhe.de/volltexte/fzk/6606/6606.pdf http://digbib.ubka.uni-karlsruhe.de/volltexte/fzk/6606/6606.... Unsurprisingly, synchrotron sources produce too much out of band radiation so heat load on the optics is high, which is not so good for fragile EUV optics that need to last a long time. As background: EUV lithography requires high power in a narrow bandpass. 250 watts of power at 13.5 nm (92 eV) with a <2% bandpass is a really tough task when you think about it. Synchrotrons fundamentally produce full spectrum radiation, and parameters of the storage ring are varied to get the desired energy distribution. Typically you then throw away all the photons other than the ones you are interested in (turning waste photons into heat), and the inherent brightness of the synchrotron source still leaves you lots of photons in your bandpass of interest. Heat loads on front end optics on insertion device beamlines at high energy storage rings like SPring-8 are hundreds of watts per square mm. cf. the power dissipation of your CPU at a few square mm die size and <100 watts power. See also: https://pure.tue.nl/ws/files/3872978/banine2014.pdf https://pure.tue.nl/ws/files/3872978/banine2014.pdf