4 ms·
There has been recent advantages in multi-column E-beam that might fix some of the throughput issues. I mostly see it used on the quality control side for SEM i
by lithost 10y ago
There has been recent advantages in multi-column E-beam that might fix some of the throughput issues. I mostly see it used on the quality control side for SEM imaging faster, but in a decade or too it might make its way into production.
http://spie.org/newsroom/4609-multiple-electron-beam-direct-write-comes-of-age http://spie.org/newsroom/4609-multiple-electron-beam-direct-...
- Animats 10y agoI wonder what happened to that. Encouraging news in 2012-2013, then nothing. Lots of interest in E-beam for mask making, but not direct-writing ICs.